Stacked polyurethane polishing pad and method of producing the same
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United States of America Patent
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Mar 13, 2007
Grant Date -
Mar 2, 2006
app pub date -
Aug 25, 2004
filing date -
Aug 25, 2004
priority date (Note) -
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status (Latency Note)
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Abstract
A polishing pad has a sublayer; a top layer attached to the sublayer, the sublayer having a modulus of elasticity between 300 and 5000 psi and a compressibility of less than 30% at 73 psi, wherein the top pad has a modulus of elasticity which is greater than the modulus of elasticity of the sublayer and a compressibility which is smaller than a compressibility of the sublayer.
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