Pattern writing apparatus and pattern writing method
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United States of America Patent
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Mar 13, 2007
Grant Date -
Oct 14, 2004
app pub date -
Apr 1, 2004
filing date -
Apr 10, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. In the pattern writing apparatus, for pattern writing, an irradiation region group on a substrate, which corresponds to the micromirror group of the DMD, is scanned in a main scanning direction that is angled relative to the direction of arrangement of the irradiation region group. The irradiation region group is also intermittently moved in the sub-scanning direction by a distance shorter than the width of the irradiation region group in the sub-scanning direction, for pattern writing of the entire substrate.
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