US Patent No: 7,190,823
Number of patents in Portfolio can not be more than 2000
Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same
Stats
-
Mar 13, 2007
Issued date -
Mar 17, 2002
filing date -
10/063,077
serial no -
In Force
status
Importance
Loading Importance Indicators...
Abstract
An overlay vernier pattern for measuring multi-layer overlay alignment accuracy and a method for measuring the same is provided. A distance between a first alignment mark in a first material layer and a second alignment mark in an underlying second material layer is measured, so as to provide an alignment offset between the first material layer and the second material layer. In addition, a distance between the second alignment mark in the second material layer and a third alignment mark in a third material layer underlying the second material layer is measured, so as to provide an alignment offset between the second material layer and the third material layer. Because the second alignment marks can be repeatedly used, scribe line areas for forming these alignment marks and measuring time are saved to increase the production throughput.
Loading the Abstract Image...
First Claim
Related Publications
Loading Related Publications...
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art
| Patent Info | (Count) | # Cites | Year |
|---|---|---|---|
|
|
|||
| 6,118,517 Mask pattern for alignment | 11 | 1997 | |
| 6,801,313 Overlay mark, method of measuring overlay accuracy, method of making alignment and semiconductor device therewith | 11 | 2000 | |
| 6,849,957 Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof | 8 | 2000 | |
|
|
|||
| 5,614,767 Alignment accuracy check pattern | 23 | 1996 | |
| 6,319,791 Semiconductor device manufacturing method and semiconductor device | 12 | 1999 | |
|
|
|||
| 6,362,491 Method of overlay measurement in both X and Y directions for photo stitch process | 8 | 1999 | |
| 6,309,944 Overlay matching method which eliminates alignment induced errors and optimizes lens matching | 8 | 2000 | |
|
|
|||
| 6,218,200 Multi-layer registration control for photolithography processes | 23 | 2000 | |
|
|
|||
| 5,005,046 Pattern forming method | 11 | 1990 | |
|
|
|||
| 6,897,956 Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device | 12 | 2002 | |
|
|
|||
| 5,635,336 Method for the preparation of a pattern overlay accuracy-measuring mark | 14 | 1996 | |
|
|
|||
| 6,228,705 Overlay process for fabricating a semiconductor device | 2 | 1999 | |
|
|
|||
| 5,917,205 Photolithographic alignment marks based on circuit pattern feature | 16 | 1997 | |
|
|
|||
| 5,322,593 Method for manufacturing polyimide multilayer wiring substrate | 20 | 1992 | |
|
|
|||
| 6,448,147 Semiconductor device and method for manufacturing the same | 2 | 2001 | |
|
|
|||
| 5,912,983 Overlay accuracy measuring method | 40 | 1997 | |
|
|
|||
| 5,783,340 Method for photolithographic definition of recessed features on a semiconductor wafer utilizing auto-focusing alignment | 72 | 1997 | |
|
|
|||
| 6,172,409 Buffer grated structure for metrology mark and method for making the same | 14 | 1997 | |
|
|
|||
| 7,008,756 Method of fabricating an X/Y alignment vernier | 2 | 2004 | |
|
|
|||
| 6,864,589 X/Y alignment vernier formed on a substrate | 4 | 2001 | |
|
|
|||
| 5,866,447 Modified zero layer align method of twin well MOS fabrication | 4 | 1996 | |
|
|
|||
| 6,077,756 Overlay target pattern and algorithm for layer-to-layer overlay metrology for semiconductor processing | 112 | 1998 | |
|
|
|||
| 6,716,653 Mask alignment structure for IC layers | 6 | 2002 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Sep 13, 2014 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Sep 13, 2018 |
| Fee | Large entity fee | small entity fee | micro entity fee |
|---|---|---|---|
| Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |