Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program
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United States of America Patent
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Mar 27, 2007
Issued Date -
N/A
app pub date -
May 5, 2006
filing date -
Feb 20, 2004
priority date (Note) -
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Abstract
A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.
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