Test structures for estimating dishing and erosion effects in copper damascene technology
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United States of America Patent
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Mar 27, 2007
Grant Date -
Nov 25, 2004
app pub date -
Sep 27, 2002
filing date -
Sep 28, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A test structure combines a first structure (1010) for erosion evaluation with a second structure (1000) for extraction of defect size distributions. The first structure (1010) is a loop structure usable determine a resistance value that varies with metal height. The second structure is a NEST structure (1000). Loop lines of the loop structure (1010) are connected on both sides of the NEST structure (1000).
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