Method for determining optimal photolithography overlay targets based on process performance and yield in microelectronic fabrication
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 3, 2007
Grant Date -
N/A
app pub date -
Jan 4, 2000
filing date -
Jan 4, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method is provided for manufacturing, the method including processing a workpiece in a processing step, measuring a parameter characteristic of the processing performed on the workpiece in the processing step, and forming an output signal corresponding to the characteristic parameter measured. The method also includes setting a target value for the processing performed in the processing step based on the output signal.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully