Methods and systems of offline measurement for process tool monitoring
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United States of America Patent
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Apr 17, 2007
Grant Date -
N/A
app pub date -
Dec 12, 2005
filing date -
Dec 12, 2005
priority date (Note) -
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Abstract
A method of offline measurement for process tool monitoring applied to semiconductor processes. A self-tuning monitor rule database, storing predefined monitor rules for lot processing is provided. Monitor data related to the lot processing is defined. Desired monitor data is obtained according to selected monitor rules residing in the self-tuning monitor rule database. Offline measurement operations are implemented according to the obtained monitor data using a process tool to generate monitor results. It is determined whether abnormal states exist by comparing the selected monitor rules and monitor data according to the monitor results. If so, the lot processing for the process tool is terminated. If not, the lot processing for the process tool is allowed. A failure notice is sent in response and the selected monitor rules are re-defined to update the self-tuning monitor rule database.
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