Methods and systems for handling a workpiece in vacuum-based material handling system
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United States of America Patent
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May 1, 2007
Grant Date -
Jun 9, 2005
app pub date -
Nov 10, 2004
filing date -
Nov 10, 2003
priority date (Note) -
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Abstract
Methods and systems are provided for handling an item in a vacuum-based handling system for semiconductor manufacturing. The methods include providing a heater or dryer for the load lock of the handling system that dries a semiconductor wafer during the pumping down of the load lock.
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