Stereolithography resins and methods
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United States of America Patent
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-
May 1, 2007
Grant Date -
Jul 15, 2004
app pub date -
Jul 29, 2003
filing date -
Jan 7, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Photocurable resin compositions are provided that are most useful in stereolithography. A photocurable resin includes a urethane acrylate oligomer, an acrylate monomer, and a polymerization modifier. The resin after curing provides a solid product that has characteristics that can depend on the resin composition.
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