Real-time component monitoring and replenishment system for multicomponent fluids
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United States of America Patent
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May 8, 2007
Grant Date -
Jul 3, 2003
app pub date -
Oct 4, 2002
filing date -
Oct 8, 2001
priority date (Note) -
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status (Latency Note)
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Abstract
A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.
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