Variable lens and exposure system

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7221514
APP PUB NO 20060245072A1
SERIAL NO

11106722

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A lithography apparatus having variable lenses.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Venema, Willem Jurrianus Eindhoven, NL 23 220

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