Plasma generation and processing with multiple radiation sources
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United States of America Patent
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Jun 5, 2007
Grant Date -
Jan 1, 2004
app pub date -
May 7, 2003
filing date -
May 8, 2002
priority date (Note) -
Expired
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Abstract
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another.
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