Method of determining optical properties and projection exposure system comprising a wavefront detection system
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United States of America Patent
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Jun 12, 2007
Grant Date -
Oct 19, 2006
app pub date -
Mar 24, 2006
filing date -
Sep 26, 2003
priority date (Note) -
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Abstract
A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (.lamda..sub.1) and a second wavelength (.lamda..sub.2), wherein a first ratio is defined as an intensity of light .lamda..sub.2 to an intensity of light .lamda..sub.1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least .lamda..sub.1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of .lamda..sub.2 to an intensity of light of .lamda..sub.1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
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