Method and system for context-specific mask inspection

United States of America Patent

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Jun 12, 2007
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Jul 8, 2004
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Jul 14, 2003
filing date
Jul 12, 2002

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Abstract

A method for inspecting lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to inspect a mask.

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Patent Owner	Address
CADENCE DESIGN SYSTEMS INC	2655 SEELY AVENUE SAN JOSE CA 95134

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G06F:ELECTRIC DIGITAL DATA PROCESSING

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Inventor Name	Address	# of filed Patents	Total Citations
Pack, Robert C	Foster City, CA	18	650
Scheffer, Louis K	Campbell, CA	39	1245

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Method and system for context-specific mask inspection

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10620284

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PATENT NO	7231628
APP PUB NO	20040133369A1
SERIAL NO	10620284
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
June 12, 2007	US,7231628,B2 US7231628B2	GRANTED PATENT AS SECOND PUBLICATION
July 08, 2004	US,20040133369,A1 US20040133369A1	FIRST PUBLISHED PATENT APPLICATION

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10620284

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