System and method for feedforward control in thin film coating processes
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United States of America Patent
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Jun 19, 2007
Grant Date -
Jun 2, 2005
app pub date -
Oct 8, 2004
filing date -
Oct 8, 2003
priority date (Note) -
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Abstract
A system and method for feedforward control in thin film coating processes. A standard PID feedback control system that continuously monitors two or more process variables in a reactive sputtering process is combined with a feedforward control system to improve system performance. The control system enables much faster stabilization of the reactive sputtering process during target start-up, and improves control of the process once a steady-state operating condition has been reached following target start-up.
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