System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold
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United States of America Patent
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Jul 10, 2007
Grant Date -
Apr 1, 2004
app pub date -
Dec 24, 2002
filing date -
Sep 30, 2002
priority date (Note) -
In Force
status (Latency Note)
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Abstract
One of many embodiments of a substrate preparation system is provided which includes a drying system, the drying system including at least one proximity head for drying a substrate. The system also includes a cleaning system for cleaning the substrate.
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Cited Art Landscape
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