Plasma device and plasma generating method
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United States of America Patent
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-
Jul 17, 2007
Grant Date -
May 20, 2004
app pub date -
Jan 18, 2002
filing date -
Jan 18, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A plasma device includes a slot antenna (30) for supplying a high frequency electromagnetic field (F) supplied through a feeding part into a processing vessel (11). The feeding part has a cavity (35) for forming a resonator and converting the fed high frequency electromagnetic field (F) into a rotating electromagnetic field and supplying the rotating electromagnetic field to the slot antenna (30).
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