Method and system for context-specific mask writing

United States of America Patent

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Jul 24, 2007
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Jun 3, 2004
app pub date
Jul 14, 2003
filing date
Jul 12, 2002

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Abstract

A method for generating lithography marks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.

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Patent Owner	Address
CADENCE DESIGN SYSTEMS INC	2655 SEELY AVENUE SAN JOSE CA 95134

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G06F:ELECTRIC DIGITAL DATA PROCESSING

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Inventor Name	Address	# of filed Patents	Total Citations
Pack, Robert C	Foster City, CA	18	650
Scheffer, Louis K	Campbell, CA	39	1245

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Method and system for context-specific mask writing

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10620285

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PATENT NO	7249342
APP PUB NO	20040107412A1
SERIAL NO	10620285
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
July 24, 2007	US,7249342,B2 US7249342B2	GRANTED PATENT AS SECOND PUBLICATION
June 03, 2004	US,20040107412,A1 US20040107412A1	FIRST PUBLISHED PATENT APPLICATION

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10620285

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