Method for fabricating a structure for a microelectromechanical system (MEMS) device
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United States of America Patent
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Jul 31, 2007
Grant Date -
Jun 30, 2005
app pub date -
Sep 14, 2004
filing date -
Feb 12, 2002
priority date (Note) -
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Abstract
The invention provides a microfabrication process which may be used to manufacture a MEMS device. In one embodiment, the process comprises depositing at least one first layer on a substrate. The process further comprises patterning said first layer to define at least a first portion of said microelectromechanical system device. The process further comprises depositing a second layer on said first layer. The process further comprises patterning said second layer using said first layer as a photomask. The process further comprises developing said second layer to define at least a second portion of the microelectromechanical system device.
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