Lithographic apparatus and device manufacturing method
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United States of America Patent
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Aug 7, 2007
Grant Date -
N/A
app pub date -
Mar 3, 2006
filing date -
Mar 3, 2006
priority date (Note) -
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Abstract
A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.
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