Systems and methods for metrology recipe and model generation
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United States of America Patent
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Aug 7, 2007
Grant Date -
Nov 2, 2006
app pub date -
Jun 21, 2006
filing date -
May 4, 2001
priority date (Note) -
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Abstract
Systems and methodologies are disclosed for generating setup information for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument to measure an unpatterned wafer and a setup information generator to generate setup information according to the unpatterned wafer measurement. The system then provides the setup information to a process measurement system for use in measuring production wafers in a semiconductor manufacturing process.
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