Lithographic apparatus and device manufacturing method

United States of America Patent

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Aug 21, 2007
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Jan 26, 2006
app pub date
Jul 26, 2004
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Jul 26, 2004

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Abstract

A lithographic apparatus is provided that uses an array of individually controllable elements to pattern the beam of radiation. The critical dimension uniformity of a substrate patterned using the apparatus is improved by adjusting the pattern data provided to the array of individually controllable elements to compensate for process variation.

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Patent Owner(s)

ADVANCED MICRO DEVICES, INC.;ASML NETHERLANDS B.V.

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G03B:APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS O....

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Inventor Name	Address	# of filed Patents	Total Citations
Bleeker, Arno J	Westerhoven, NL	8	68
Tel, Wim T	Helmond, NL	3	54

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Lithographic apparatus and device manufacturing method

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United States of America Patent

10898667

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PATENT NO	7259829
APP PUB NO	20060017903A1
SERIAL NO	10898667
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 21, 2007	US,7259829,B2 US7259829B2	GRANTED PATENT AS SECOND PUBLICATION
January 26, 2006	US,20060017903,A1 US20060017903A1	FIRST PUBLISHED PATENT APPLICATION

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10898667

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