Process for treating solid surface and substrate surface
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 4, 2007
Grant Date -
Feb 23, 2006
app pub date -
Oct 19, 2005
filing date -
Apr 24, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Ruthenium, osmium and their oxides can be etched simply and rapidly by supplying an atomic oxygen-donating gas, typically ozone, to the aforementioned metals and their oxides through catalysis between the metals and their oxides, and the ozone without any damages to wafers and reactors and application of the catalysis not only to the etching but also to chamber cleaning ensures stable operation of reactors and production of high quality devices.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully