Pattern writing apparatus and block number determining method
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United States of America Patent
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Sep 11, 2007
Grant Date -
Nov 30, 2006
app pub date -
May 31, 2006
filing date -
May 31, 2005
priority date (Note) -
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status (Latency Note)
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Abstract
A pattern writing apparatus comprises a DMD for spatially modulating light from a light source and directing modulated light beams to a plurality of irradiation regions, respectively, which are arranged on a substrate two-dimensionally. A pattern is written by controlling the DMD while scanning the plurality of irradiation regions. The plurality of irradiation regions form a plurality of irradiation blocks arranged in a column direction, in each of which irradiation regions are arranged in a row direction. In DMD, writing signal is sequentially inputted to mirror blocks to be used out of a plurality of mirror blocks corresponding to the plurality of irradiation blocks, respectively. When writing a pattern, an operation part determines the number of mirror blocks to be used where scan speed can be maximized, in consideration of required time for input of the writing signal to the DMD and light amount applied on the substrate.
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