Method and apparatus of generating PDMAT precursor
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United States of America Patent
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Sep 18, 2007
Grant Date -
Sep 1, 2005
app pub date -
May 2, 2005
filing date -
Jul 17, 2002
priority date (Note) -
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Abstract
A precursor and method for filling a feature in a substrate. The method generally includes depositing a barrier layer, the barrier layer being formed from pentakis(dimethylamido)tantalum having less than about 5 ppm of impurities. The method additionally may include depositing a seed layer over the barrier layer and depositing a conductive layer over the seed layer. The precursor generally includes pentakis(dimethylamido)tantalum having less than about 5 ppm of impurities. The precursor is generated in a canister coupled to a heating element configured to reduce formation of impurities.
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