Dual-wavelength positive-working radiation-sensitive elements

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United States of America Patent

PATENT NO 7279263
APP PUB NO 20050287468A1
SERIAL NO

11157204

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Abstract

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A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polymers capable of being eluted in an alkaline aqueous solution and a development-enhancing compound. The invention provides a positive-working photosensitive composition of good sensitivity for use with one or both of ultra-violet radiation and an infrared laser radiation source. The composition is stable in its state before exposure and has an excellent handling property. The sensitivity of a radiation-sensitive coating based on the composition of this invention is increased without compromising the handling characteristics. Radiation-sensitive elements based on the composition of the invention have good development latitude. A positive-working lithographic printing precursor is based on the radiation-sensitive composition coated on a hydrophilic surface. The precursor is developable using an alkaline aqueous solution, and may be used with a radiation source in lithographic applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications. The precursor is stable in its state before exposure and has an excellent handling property.

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Patent Owner(s)

Patent OwnerAddress
CREO INCBURNABY BRITISH COLUMBIA V5G 4M1

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goodin, Jonathan W Tyler, TX 18 64

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