Systems and methods for depositing material onto microfeature workpieces in reaction chambers
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United States of America Patent
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Oct 16, 2007
Grant Date -
Mar 24, 2005
app pub date -
Sep 18, 2003
filing date -
Sep 18, 2003
priority date (Note) -
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Abstract
In one embodiment, the system includes a gas supply assembly having a first gas source, a first gas conduit coupled to the first gas source, a first valve assembly, a reaction chamber, and a gas distributor carried by the reaction chamber. The first valve assembly includes first and second valves that are in fluid communication with the first gas conduit. The first and second valves are configured in a parallel arrangement so that the first gas flows through the first valve and/or the second valve.
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