Lithographic apparatus, device manufacturing method and device manufacturing thereby
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United States of America Patent
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Oct 30, 2007
Grant Date -
Dec 30, 2004
app pub date -
Apr 16, 2004
filing date -
Aug 24, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.
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