Apparatus and process for the determination of static lens field curvature
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 13, 2007
Grant Date -
Nov 17, 2005
app pub date -
May 12, 2004
filing date -
May 12, 2004
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A process for the determination of focal plane deviation uniquely due to the lens field curvature associated with a photolithographic projection tool is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a stepper or scanner running in static mode. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that calculates the lens field curvature in an absolute sense in the presence of wafer height variation and varying stage performance.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully