Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Nov 20, 2007
Grant Date -
Jun 16, 2005
app pub date -
Jan 28, 2005
filing date -
Jul 29, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for manufacturing an article having polymeric residue that is to be removed during the manufacture of the article is disclosed. The article is introduced into a controlled environment of a processing tool having one or more processing chambers. Free radicals are generated from one or more reactant gases and introduced into at least one of the one or more processing chambers where they react with the polymeric residue. A cryogenic cleaning medium is supplied into at least one of the one or more processing chambers where the cryogenic cleaning medium removes the polymeric residue present after the free radicals react with the polymeric residue. The reactant gases are selected to facilitate removal of the polymeric residue with the cryogenic cleaning medium. The cryogenic cleaning medium is supplied with a pulsating flow via a nozzle implement that sweeps across the article. The pulsating flow may be generated via a piezo device or a rotating shaft with a hole the periodically enables or interrupts flow through a flow channel.
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