Method and system for performing shapes correction of a multi-cell reticle photomask design
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United States of America Patent
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Nov 27, 2007
Grant Date -
Mar 15, 2007
app pub date -
Sep 15, 2005
filing date -
Sep 15, 2005
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for reticle design correction and electrical parameter extraction of a multi-cell reticle design. The method including: selecting a subset of cell designs of a multi-cell reticle design, each cell design of the subset of cell designs having a corresponding shape to process, for each cell design of the subset of cell designs determining a respective cell design location of the corresponding shape; determining a common shapes processing rule for all corresponding shapes of each cell design based on the respective cell design locations of each of the corresponding shapes; and performing shapes processing of the corresponding shape only of a single cell design of the subset of cell designs to generate resulting data for the subset of cell designs. Also a computer usable medium including computer readable program code having an algorithm adapted to implement the method for reticle design correction and electrical extraction.
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