Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing method

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United States of America Patent

PATENT NO 7307694
APP PUB NO 20070002301A1
SERIAL NO

11169307

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Abstract

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A lithographic apparatus having a radiation beam inspection device including a barrier to the beam of radiation, the barrier having an aperture through which a portion of the beam of radiation passes; and a radiation sensor that determines the intensity of the radiation passing through the aperture and the position, relative to the aperture, of the point at which the radiation is incident on the radiation sensor.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Venema, Willem Jurrianus Eindhoven, NL 23 220

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