Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 25, 2007
Grant Date -
Sep 22, 2005
app pub date -
Sep 30, 2004
filing date -
Oct 1, 2003
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method of measuring properties of a substrate, the method involving: illuminating a spot on the substrate with a standing wave measurement beam to generate a return measurement beam, the standing wave measurement beam characterized by a standing wave pattern; generating an electrical signal from the return measurement beam; causing the standing wave pattern to be at a succession of different positions on the surface of the substrate; and for each of the succession of different positions of the standing wave pattern, acquiring measurement data from the electrical signal.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully