Supercritical fluid technology for cleaning processing chambers and systems
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United States of America Patent
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Jan 29, 2008
Grant Date -
Feb 10, 2005
app pub date -
Aug 6, 2003
filing date -
Aug 6, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention includes a method of cleaning a processing chamber by introducing supercritical fluid into the processing chamber. A residue over an internal chamber surface is contacted with the supercritical fluid to remove the residue from the surface. The invention also includes a method of removing deposited material from internal surfaces of a processing system. A cleaning agent comprising at least one of C.sub.3H.sub.8, C.sub.2H.sub.6 and CH.sub.4 is provided in supercritical phase into at least a portion of the processing system. A material deposited on an internal surface of the processing system is contacted with the cleaning agent to remove at least a portion of the deposited material.
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