Apparatus and method for ellipsometric measurements with high spatial resolution
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United States of America Patent
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Jan 29, 2008
Grant Date -
May 26, 2005
app pub date -
Jul 7, 2004
filing date -
Jul 7, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of detecting non-uniform ellipsometric properties of a substrate surface involving: directing a measurement beam onto a spot at a selected location on or in the substrate; for each orientation of a plurality of different orientations of the reference beam relative to the scattered measurement beam, interfering the scattered measurement beam with the reference beam to produce a corresponding interference beam, wherein each of the different orientations of the reference beam is selected to produce a peak sensitivity for a portion of the scattered measurement beam that emanates from the object at a corresponding different diffraction angle of a plurality of diffraction angles; for each orientation of the reference beam, converting the interference beam into an interference signal; and using the interference signals to determine whether any non-uniform ellipsometric properties are present anywhere within a region on or in the substrate.
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