Vertically adjustable chemical mechanical polishing head and method for use thereof

United States of America Patent

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Feb 5, 2008
Grant Date
Jun 24, 2004
app pub date
Nov 4, 2003
filing date
Nov 7, 2002

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Abstract

The invention provides a vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof.

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Patent Owner(s)

Patent Owner	Address
EBARA TECHNOLOGIES INCORPORATED	51 MAIN AVENUE SACRAMENTO CA 95838

International Classification(s)

B24B:MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR PO....

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Inventor Name	Address	# of filed Patents	Total Citations
Lao, Peter	San Jose, CA	4	35
Liu, Jun	Cupertino, CA	1497	18125
Moloney, Gerard	Milpitas, CA	5	59
Sakurai, Kunihiko	San Jose, CA	61	718
Wang, Huey-Ming	Fremont, CA	23	426

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Vertically adjustable chemical mechanical polishing head and method for use thereof

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United States of America Patent

10700984

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PATENT NO	7326103
APP PUB NO	20040121704A1
SERIAL NO	10700984
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
February 05, 2008	US,7326103,B2 US7326103B2	GRANTED PATENT AS SECOND PUBLICATION
June 24, 2004	US,20040121704,A1 US20040121704A1	FIRST PUBLISHED PATENT APPLICATION

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10700984

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