Papermachine clothing having reduced void spaces
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United States of America Patent
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-
Feb 19, 2008
Grant Date -
May 18, 2006
app pub date -
Nov 17, 2004
filing date -
Nov 17, 2004
priority date (Note) -
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status (Latency Note)
Importance
Abstract
Paper-machine clothing comprising a woven structure and a filling component. A filament and a second filament of the woven structure intersect in a weave pattern contact each other. Void spaces produced by the intersection of the first filament and the second filament are substantially filled by a durable filling component. The durable component adheres to at most one of the first and second filaments.
First Claim
Family
International Classification(s)
Cited Art Landscape
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