Lithographic apparatus and positioning apparatus
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United States of America Patent
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-
Mar 25, 2008
Grant Date -
Oct 26, 2006
app pub date -
Apr 20, 2005
filing date -
Apr 20, 2005
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, resp. a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
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