Chambers, systems, and methods for electrochemically processing microfeature workpieces
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United States of America Patent
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Apr 1, 2008
Grant Date -
Jun 9, 2005
app pub date -
Dec 5, 2003
filing date -
Dec 5, 2003
priority date (Note) -
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Abstract
Chambers, systems, and methods for electrochemically processing microfeature workpieces are disclosed herein. In one embodiment, an electrochemical deposition chamber includes a processing unit having a first flow system configured to convey a flow of a first processing fluid to a microfeature workpiece. The chamber further includes an electrode unit having a plurality of electrodes and a second flow system configured to convey a flow of a second processing fluid at least proximate to the electrodes. The chamber further includes a barrier between the processing unit and the electrode unit to separate the first and second processing fluids. The barrier can be a porous, permeable barrier or a nonporous, semipermeable barrier.
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