Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths
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United States of America Patent
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Apr 1, 2008
Grant Date -
Jun 1, 2006
app pub date -
Nov 30, 2004
filing date -
Nov 30, 2004
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for forming a plurality of parallel metal lines on a substrate of thin film elastomeric material and a wire grid polarizer formed by such method. A sacrificial layer is formed by coating the substrate with a water soluble polymer while the substrate is stretched. The existing tensile force is removed, leaving an undulating topology of buckled sacrificial layer material. A masking layer is then deposited at an oblique angle and then fractured into parallel lines of material by application of a second tensile force. Unmasked portions of the sacrificial layer are removed by dry etch. A metallic layer is then deposited and a lift off process employed to remove remaining portions of the sacrificial layer and materials deposited thereover. Upon removal of the second tensile force, the substrate returns to its unstressed length with metal lines of predetermined periodicity thereon.
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