Test pattern and method of evaluating the transfer properties of a test pattern
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United States of America Patent
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Apr 8, 2008
Grant Date -
Sep 6, 2007
app pub date -
Mar 5, 2007
filing date -
Mar 6, 2006
priority date (Note) -
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status (Latency Note)
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Abstract
A test pattern or set of patterns, a method of evaluating the transfer properties of the pattern, and a method of determining a parameter of a transfer process (e.g., imaging process) making use of the test pattern is provided. With the test pattern, the impact of line edge roughness on a transferred pattern may be analyzed. For example, the test pattern may be based upon a lines/spaces pattern, wherein periodic structures having a well-defined period and amplitude are adjacent to the lines. A photomask is provided with the test pattern and an image of the pattern is obtained. Edges of the image are determined and, therefrom, a set of edge position data are obtained. Edge position data are fitted to a straight line to determine edge position residuals. An amplitude spectrum is calculated dependent upon spatial frequencies to obtain a amplitude/spatial frequency relationship. A ratio of determined maximum is formed.
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