
US Patent No: 7,355,675
Number of patents in Portfolio can not be more than 2000
Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
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Apr 8, 2008
Issued date -
May 24, 2005
filing date -
11/135,630
serial no -
In Force
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Abstract
A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
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| 5,144,363 Apparatus for and method of projecting a mask pattern on a substrate | 53 | 1991 | |
| 5,969,441 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device | 401 | 1997 | |
| 6,297,876 Lithographic projection apparatus with an alignment system for aligning substrate on mask | 44 | 1998 | |
| 6,262,796 Positioning device having two object holders | 148 | 1998 | |
| 6,710,849 Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method | 11 | 2001 | |
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| 2003/0096,496 Method of forming dual damascene structure | 1 | 2001 | |
| 2004/0075,179 Structural design of alignment mark | 8 | 2002 | |
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| 4,778,275 Method of aligning a mask and a substrate relative to each other and arrangement for carrying out the method | 85 | 1986 | |
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| 6,774,452 Semiconductor structure having alignment marks with shallow trench isolation | 15 | 2002 | |
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| 2007/0164,117 Methods of forming and detecting non-visible marks and articles marked in accordance with the methods | 1 | 2005 | |
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| 6,452,284 Semiconductor device substrate and a process for altering a semiconductor device | 9 | 2000 | |
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| 6,815,838 Laser alignment target and method | 2 | 2002 | |
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| 5,969,428 Alignment mark, manufacturing method thereof, exposing method using the alignment mark, semiconductor device manufactured using the exposing method | 24 | 1998 | |
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| 6,157,087 Consistent alignment mark profiles on semiconductor wafers using metal organic chemical vapor deposition titanium nitride protective layer | 12 | 1999 | |
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| 5,633,698 Exposure apparatus | 23 | 1995 | |
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| 6,133,641 Semiconductor substrate and method of manufacturing semiconductor device | 17 | 1998 | |
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| 5,985,764 Layer independent alignment system | 17 | 1997 | |
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| 4,356,392 Optical imaging system provided with an opto-electronic detection system for determining a deviation between the image plane of the imaging system and a second plane on which an image is to be formed | 45 | 1980 | |
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| 5,960,107 Method for verifying an average topography height function of a photostepper | 9 | 1995 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Oct 8, 2015 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Oct 8, 2019 |
| Fee | Large entity fee | small entity fee | micro entity fee |
|---|---|---|---|
| Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |