US Patent No: 7,355,675

Number of patents in Portfolio can not be more than 2000

Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus

ALSO PUBLISHED AS: 20060138410

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Abstract

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A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
ASML NETHERLANDS B.V.VELDHOVEN2355

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hauschild, Jan Eindhoven, NL 14 14
Lalbahadoersing, Sanjay Helmond, NL 6 9
Pieters, Marco Johannes Annemarie Eindhoven, NL 2 0
Van, De Vin Coen Weert, NL 4 0

Cited Art Landscape

Patent Info (Count) # Cites Year
 
ASML NETHERLANDS B.V. (5)
4,778,275 Method of aligning a mask and a substrate relative to each other and arrangement for carrying out the method 87 1986
5,144,363 Apparatus for and method of projecting a mask pattern on a substrate 57 1991
5,969,441 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device 526 1997
6,262,796 Positioning device having two object holders 204 1998
6,710,849 Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method 19 2001
 
UNITED MICROELECTRONICS CORP. (2)
* 2003/0096,496 Method of forming dual damascene structure 1 2001
2004/0075,179 Structural design of alignment mark 8 2002
 
ASM LITHOGRAPY B.V. (1)
6,297,876 Lithographic projection apparatus with an alignment system for aligning substrate on mask 51 1998
 
CYPRESS SEMICONDUCTOR CORPORATION (1)
* 6,774,452 Semiconductor structure having alignment marks with shallow trench isolation 15 2002
 
FERRO CORPORATION (1)
* 2007/0164,117 Methods of forming and detecting non-visible marks and articles marked in accordance with the methods 2 2005
 
FREESCALE SEMICONDUCTOR, INC. (1)
* 6,452,284 Semiconductor device substrate and a process for altering a semiconductor device 9 2000
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
* 6,815,838 Laser alignment target and method 2 2002
 
KABUSHIKI KAISHA TOSHIBA (1)
* 5,969,428 Alignment mark, manufacturing method thereof, exposing method using the alignment mark, semiconductor device manufactured using the exposing method 24 1998
 
LSI LOGIC CORPORATION (1)
6,157,087 Consistent alignment mark profiles on semiconductor wafers using metal organic chemical vapor deposition titanium nitride protective layer 13 1999
 
Nixon Corporation (1)
* 5,633,698 Exposure apparatus 26 1995
 
RENESAS ELECTRONICS CORPORATION (1)
6,133,641 Semiconductor substrate and method of manufacturing semiconductor device 19 1998
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (1)
5,985,764 Layer independent alignment system 18 1997
 
U.S. PHILIPS CORPORATION (1)
4,356,392 Optical imaging system provided with an opto-electronic detection system for determining a deviation between the image plane of the imaging system and a second plane on which an image is to be formed 45 1980
 
VLSI TECHNOLOGY, INC. (1)
* 5,960,107 Method for verifying an average topography height function of a photostepper 10 1995
* Cited By Examiner

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