Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7361445
APP PUB NO 20050266334A1
SERIAL NO

11175813

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Abstract

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A positive-working photosensitive resin composition containing an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a --CH.sub.2OH group but not a phenolic hydroxyl group, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device. Also, disclosed is a positive-working photosensitive resin composition containing an alkali soluble resin (A), a diazoquinone compound (B) and a mixture solvent of two or more kinds (D), wherein the mixture solvent (D) contains .gamma.-butyrolactone and propylene glycol monoalkyl ether and the total amount of .gamma.-butyrolactone and propylene glycol monoalkyl ether is about 70 wt % or more of the total amount of solvent, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device.

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Patent Owner(s)

Patent OwnerAddress
FUJI JUKOGYO KABUSHIKI KAISHATOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banba, Toshio Tokyo, JP 24 200
Hirano, Takashi Tokyo, JP 166 2103
Ikeda, Takuji Tokyo, JP 10 63
Yano, Tatsuya Tokyo, JP 14 59

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