Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element
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United States of America Patent
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Apr 29, 2008
Grant Date -
Aug 3, 2006
app pub date -
Apr 3, 2006
filing date -
Oct 19, 2001
priority date (Note) -
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Abstract
A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 .mu.m) of solar ray, a process for its production, and a photoelectric-conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
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