System and method using visible and infrared light to align and measure alignment patterns on multiple layers
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United States of America Patent
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Apr 29, 2008
Grant Date -
Jun 1, 2006
app pub date -
Nov 15, 2005
filing date -
Dec 1, 2004
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. Visible light is used to detect alignment patterns on the surface layer and infrared light is used to detect patterns one layers below the surface. For example, reflected visible light and transmitted infrared light are co-focused onto detector after impinging on respective alignment patterns. The co-focused light is then used to determine proper alignment of the object for subsequent pattern features. This substantially increases accuracy of alignment of pattern features between layers, as compared to conventional systems.
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