Apparatus and method for providing a confined liquid for immersion lithography

United States of America Patent

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May 6, 2008
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N/A
app pub date
Apr 28, 2004
filing date
Sep 30, 2002

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Expired

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Abstract

A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.

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Patent Owner(s)

Patent Owner	Address
LAM RESEARCH CORPORATION	4650 CUSHING PARKWAY OAKLAND CA 94538

International Classification(s)

B08B:CLEANING IN GENERAL; PREVENTION OF FOULING IN GENE....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Boyd, John	Atascadero, CA	71	1051
de, Larios John M	Palo Alto, CA	72	1005
Hemker, David	San Jose, CA	27	439
Korolik, Mikhail	San Jose, CA	88	4555
Ravkin, Michael	Sunnyvale, CA	72	1438
Redeker, Fred C	Fremont, CA	195	5499

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Apparatus and method for providing a confined liquid for immersion lithography

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United States of America Patent

10834548

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PATENT NO	7367345
SERIAL NO	10834548
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10834548

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