Method and device for immersion lithography
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United States of America Patent
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May 6, 2008
Grant Date -
Apr 7, 2005
app pub date -
Oct 3, 2003
filing date -
Oct 3, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiation onto an object plane, a mask, adapted to receive and modulate said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said work piece, and an immersion medium contacting at least a portion of a final lens of said lithographic system and a portion of said work piece, wherein an area of said contacting is restricted by capillary forces. The invention further relates to a method for patterning a workpiece.
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