Method of manufacturing microlens, microlens, microlens array, electro-optical device, and electronic apparatus

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United States of America Patent

PATENT NO 7372631
APP PUB NO 20060046486A1
SERIAL NO

11175265

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Abstract

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A method of manufacturing a microlens includes: forming on a transparent substrate an etching stop layer in a lens formation region where a curved lens surface of the microlens is to be formed, the etching stop layer having an island shape as a planar shape thereof; forming an intermediate layer on the etching stop layer; forming an etching mask layer on the intermediate layer, the etching mask layer having an opening at a position facing the etching stop layer; and etching, by means of isotropic etching, the intermediate layer from the opening, and etching the transparent substrate and the intermediate layer from a side of the etching stop layer.

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Patent Owner(s)

Patent OwnerAddress
SEIKO EPSON CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ozawa, Norihiko Shiojiri, JP 12 115

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