Methods and systems for reticle inspection and defect review using aerial imaging
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United States of America Patent
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May 27, 2008
Grant Date -
N/A
app pub date -
Oct 6, 2003
filing date -
Oct 15, 2002
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Methods and systems for inspecting a reticle are provided. In an embodiment, a system may include an inspection subsystem configured to form a first aerial image of the reticle. The first aerial image may be used to detect defects on the reticle. The system may also include a review subsystem coupled to the inspection subsystem. For example, the inspection and review subsystems may have common optics, separate optics and a common stage, or separate stages and a common handler. The review subsystem may be configured to form a second aerial image of the reticle. The second aerial image may be used to analyze the defects. In another embodiment, the system may include an image computer configured to receive image data from the inspection and review subsystems representing the first and second aerial images. The image computer may also be configured to perform one or more functions on the image data.
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