Reference wafer calibration reticle
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Jun 3, 2008
Grant Date -
Sep 20, 2007
app pub date -
Apr 30, 2007
filing date -
Dec 8, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility where an archive media includes etched alignment attributes. Exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming completed alignment attributes. Then, measuring offsets in the completed alignment attributes and constructing a calibration file for the archive media based upon the offset measurements and other characteristic data of the exposure tool.
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